67) Match List I with List II
| List I | List II |
|---|---|
| A. Diffusion | I. PMMA |
| B. Oxidation | II. Proximity Printing |
| C. UV Resist | III. ∂C(x,t)/∂t = −∂J(x,t)/∂x |
| D. X-ray Lithography | IV. Deal and Grove's Model |
Choose the correct answer from the options given below:
Solution
A. Diffusion matches with III: The equation ∂C(x,t)
=−
∂x
∂J(x,t)
represents Fick's second law, which describes the process of diffusion.
B. Oxidation matches with IV: The Deal and Grove’s Model is the standard mathematical model used to describe the growth of an oxide layer on a semiconductor surface.
C. UV Resist matches with I: PMMA (Polymethyl methacrylate) is a common polymer used as a resist in various lithography processes, including deep UV.
D. X-ray Lithography matches with II: Proximity Printing is the standard exposure method used in X-ray lithography to prevent mask damage while maintaining high resolution.
Therefore, the matching is: A - III, B - IV, C - I, D - II.