Ion Implantation
Ion implantation is a process used to change the electrical properties of silicon.
How it works:
- High-energy ions (like boron or phosphorus) are shot into a silicon wafer
- This "dopes" the silicon to make it:
- n-type (more electrons)
- p-type (more holes)
Why it matters:
- Creates regions that control how current flows
- Essential for building transistors